イオンソースおよびプラズマソース用アルミナ部品

In modern plasma and ion source technology, reliability depends on materials that can endure extreme electric fields, thermal cycling, and high-vacuum environments. Among all engineering ceramics, alumina (Al₂O₃) remains the preferred choice for RF and DC plasma applications — balancing mechanical strength, electrical insulation, and chemical stability.

Why Alumina is Ideal for Ion and Plasma Sources

Alumina ceramics combine several critical advantages that make them indispensable for plasma-based systems:

Excellent dielectric strength for high-voltage and RF applications
High thermal stability, maintaining structure and insulation up to 1600 °C
Vacuum compatibility — extremely low outgassing and contamination
Resistance to plasma erosion and reactive gases such as Ar, O₂, or CF₄
Precision machinability for complex geometries and fine tolerances

These properties make alumina ideal for both RF plasma sources operating at 13.56 MHz and ion beam systems where precise electrical isolation and vacuum sealing are essential.

Common Alumina Components Used in Ion and Plasma Sources

Cup-shaped discharge chambers
- Used as plasma confinement cavities.
- Provide electrical isolation between cathode, anode, and extraction electrodes.
RF vacuum windows
- Transmit 13.56 MHz RF power into the plasma chamber.
- Designed to withstand vacuum pressure and temperature cycling.
Insulating rings and spacers
- Separate metal electrodes and structural parts.
- Maintain mechanical alignment under high-voltage operation.
Gas feedthrough insulators and support tubes
- Used to introduce gases or cooling lines while maintaining vacuum integrity.

Precision Machining Capabilities

At Jundro Ceramics , we have advanced 3-axis, 4-axis, and 5-axis CNC machining centers capable of achieving:

Dimensional tolerance: ±0.01 mm
表面粗さ： Ra 0.01 μm
平坦さ： up to 0.001 mm
Complex internal and external geometries

Each part is manufactured under strict ISO 9001 quality control and can be customized according to drawings or 3D CAD files (STEP, STP, PDF).

Applications We Support

RF plasma generators and etching systems
Ion and neutral beam sources
Accelerator and fusion research
Semiconductor deposition and sputtering systems
Space propulsion and plasma diagnostics

We have successfully supplied alumina parts, including cup-type ion source chambers, to international research institutes and plasma equipment manufacturers.