Hochleistungskeramik in horizontalen 300-mm-Waferverarbeitungsanlagen
Among today’s wafer batch processing equipment, take centrotherm’s c.HORICOO300 as an example. This equipment is used by Renesas Electronics of Japan in its 300mm power semiconductor production line in Yamanashi Prefecture, mainly for oxidation and annealing processes. The system adopts an 8-tube cluster design and is equipped with a fully automatic wafer and wafer boat